Product Description:
The recently developed crystal epitaxial lift-off technique, namely CIS (crystal ion slicing), enables
one to slice a thin film (about lm) from a bulk material wafer by ion implantation. Ion implantation is used to create a buried sacrificial layer in the single-crystal wafer, inducing a different etching selectivity between the sacrificial layer and the rest of the sample.In this study, the LiNbO3 single-crystal sample was implanted by 250 keV 4He ions with a 1 · 1017 ions/cm2 fluence. A 0.6 lm lift-off film was obtained with a following hydrofluoric acid etching.
Company Contact:
Contact Name: Jingzheng
Company Name: Jinan Jingzheng Electronics Co., Ltd.
Email:
Tel: +86-0531-66956298
Fax: +86-531-88809907
Street Address: D201, 750 Shunhua Road,
Jinan High-tech Zone, Jinan 250101, P. R. China
Website:
https://www.nanoln.com
Member name: Lnoi
Country:
China
Member Since: 04 January 2013
Total Leads:
277 Lnoi Import Export Business Leads
Business focus: Single Crystal Lithium Niobate Thin Film, Lithium Niobate Thin Film, Thin Lithium Tantalite, Linbo3 Film, Lnoi
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