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Hafnium Oxide Hfo2, Ho2o3 Disk, Lsmo Lthanum Strontium Manganese Oxide Ceramic Targets
Posted at: Offers to Sell and Export | Posted on: Wednesday 24 September 2014 3:20 am | Poster last visit: Wednesday 24 September 2014 |
Product Category: Main
» Electronic Components and Supplies
» Electronic hardware and component parts and accessories
» Electronic component parts and raw materials and accessories
» Sputtering targets
» Hafnium Oxide Hfo2, Ho2o3 Disk, Lsmo Lthanum Strontium Manganese Oxide Ceramic Targets
Product Description:
The dependence of the chemical states of the constituent elements of a PZT thin film prepared by RF magnetron
co-sputtering using ceramic PZT and metallic Pb dual target materials on the Ar+ etching time was studied using XPS. The metallic Pb, lead oxide and Pb in PZT led to the different binding energies of the Pb lines.
The intensity of binding energy of metallic Pb relative to that of bulk Pb increased with the depth of the film. The peak position and the line shape of the O1s electron was associated with the different binding energies of oxygen, which interacts with Pb and Ti and Zr atoms to form the metal oxides, and the softening of the O1s bonds by the bonding interaction in Ti–O, Zr–O and Pb–O. The broad Ti2p3/2 line in the PZT film could has been associated with the various charge state of Ti and no spectral changes of Ti2p and Zr3d were observed as the Ar+ ion sputtering time was increased.
Company Contact:
Contact Name: Tom Zhu
Company Name: East High Tech Limited
Email:
Tel: +86-25-57248353
Fax: +86-25-57209791
Street Address: Shahe Road 58#,
Lishui
China, Jiangsu 211200
China
Member name: EastHighTechLimited
Country:
China
Member Since: 24 September 2014
Total Leads: 44 EastHighTechLimited Import Export Business Leads
Business focus: Ceramic Sputtering Targets Ito, Izo, Azo, Gzo, Igzo, Ybco, Pzt, Sm2o3, Eu2o3, Gd2o3, Tb4o7, Dy2o3, Ho2o3, Er2o3, Tm2o3, Yb2o3, Lu2o3, Sc2o3, Y2o3, Ta2o5
Chat:
Verify: Safe Import Export Tips
co-sputtering using ceramic PZT and metallic Pb dual target materials on the Ar+ etching time was studied using XPS. The metallic Pb, lead oxide and Pb in PZT led to the different binding energies of the Pb lines.
The intensity of binding energy of metallic Pb relative to that of bulk Pb increased with the depth of the film. The peak position and the line shape of the O1s electron was associated with the different binding energies of oxygen, which interacts with Pb and Ti and Zr atoms to form the metal oxides, and the softening of the O1s bonds by the bonding interaction in Ti–O, Zr–O and Pb–O. The broad Ti2p3/2 line in the PZT film could has been associated with the various charge state of Ti and no spectral changes of Ti2p and Zr3d were observed as the Ar+ ion sputtering time was increased.
Company Contact:
Contact Name: Tom Zhu
Company Name: East High Tech Limited
Email:
Tel: +86-25-57248353
Fax: +86-25-57209791
Street Address: Shahe Road 58#,
Lishui
China, Jiangsu 211200
China
Member name: EastHighTechLimited
Country:
ChinaMember Since: 24 September 2014
Total Leads: 44 EastHighTechLimited Import Export Business Leads
Business focus: Ceramic Sputtering Targets Ito, Izo, Azo, Gzo, Igzo, Ybco, Pzt, Sm2o3, Eu2o3, Gd2o3, Tb4o7, Dy2o3, Ho2o3, Er2o3, Tm2o3, Yb2o3, Lu2o3, Sc2o3, Y2o3, Ta2o5
Chat:
Verify: Safe Import Export Tips
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Sputtering targets Classification Navigation
Main - Electronic Components and Supplies - Electronic hardware and component parts and accessories - Electronic component parts and raw materials and accessories - Sputtering targets [16]
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