Product Description:
Mg-doped lithium niobate crystals (MgLiNbO3) is a relatively difficult crystal etching, the dry etching
MgLiNbO3 rate and etching morphology control is lithium niobate optoelectronic devices one of the key technologies in processing. The Plasmalab System 100 Oxford instruments used to SF6 / Ar to etching gas, specific research MgLiNbO3 with inductively coupled plasma (ICP) etching rate power, reactive ion etching (RIE), power, air chamber pressure and gas flow ratio of the change of the etching parameters, such as, at the same time study found SF6 / (Ar + SF6 gas flow ratio can also affect the etching the roughness of the surface. The experimental results show that: in the ICP power is 1000 W, RIE power is 150 W, the standard state (0 ℃, 1 standard atmospheric pressure) gas under traffic for 52 mL/min, the pressure of 0.532 Pa, SF6 / SF6 (Ar +) under the condition of gas volume fraction of 0.077, the etching rate can be up to 152 nm/min, etching the surface roughness is 1.37 nm, etching depth is 2.5 mu m can be obtained, the surface of the wall Angle is 74.8 ° flat ridge MgLiNbO3 structure..
Company Contact:
Contact Name: Jingzheng
Company Name: Jinan Jingzheng Electronics Co., Ltd.
Email:
Tel: +86-0531-66956298
Fax: +86-531-88809907
Street Address: D201, 750 Shunhua Road,
Jinan High-tech Zone, Jinan 250101, P. R. China
Website:
https://www.nanoln.com
Member name: Lnoi
Country:
China
Member Since: 04 January 2013
Total Leads:
277 Lnoi Import Export Business Leads
Business focus: Single Crystal Lithium Niobate Thin Film, Lithium Niobate Thin Film, Thin Lithium Tantalite, Linbo3 Film, Lnoi
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