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Tb4o7 Terbium Oxide , Tio2 Titanium Dioxide Sputtering Targets

Posted at: Offers to Sell and Export | Posted on: Wednesday 24 September 2014 3:30 am | Poster last visit: Wednesday 24 September 2014 |

Product Category: Main » Electronic Components and Supplies » Electronic hardware and component parts and accessories » Electronic component parts and raw materials and accessories » Sputtering targets » Tb4o7 Terbium Oxide , Tio2 Titanium Dioxide Sputtering Targets


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tb4o7 terbium oxide tio2 titanium dioxide sputtering targets

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Product Description:

High pure Tantalum Nitride, TaN Evaporating coating material: purity: 99.5%, Size: 1-6mm, 8 x 6mm, 18



x 10mm, 20 x 8mm or made per requested, Shape: pieces, chunks, pellets e.t.c, Tantalum nitride (TaN), Formula: Ta1N1at%, Molar mass: 194.955 g/mol, Appearance: black crystals, Density: 14.3 g/cm3, Melting point: 3090 °C, 3363 K, 5594 °F. Solubility in water insoluble. It is an inorganic chemical compound. It is sometimes used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and have other electronic applications



Company Contact:

No member photo
Contact Name: Tom Zhu
Company Name: East High Tech Limited
Email: Email
Tel: +86-25-57248353
Fax: +86-25-57209791
Street Address: Shahe Road 58#,
Lishui
China, Jiangsu 211200
China
Member name: EastHighTechLimited
Country: China-CN China
Member Since: 24 September 2014
Total Leads: 44 EastHighTechLimited Import Export Business Leads
Business focus: Ceramic Sputtering Targets Ito, Izo, Azo, Gzo, Igzo, Ybco, Pzt, Sm2o3, Eu2o3, Gd2o3, Tb4o7, Dy2o3, Ho2o3, Er2o3, Tm2o3, Yb2o3, Lu2o3, Sc2o3, Y2o3, Ta2o5
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