Product Description:
In conclusion, it has been shown that ion-beam enhanced etching is well applicable to pattern LN with
ultrathin, high-index contrast membranes, which is achieved by an air gap between membrane and substrate.A buried amorphous layer, created by irradiation with ions, is removed by means of wet chemical etching in HF solution. In order to avoid surface damage, only light ions (e.g., He) can be used. In case of room-temperature irradiation, the surface layer is destroyed owing to crack formation. For irradiation with He ions at low temperatures, gas bubble formation along with stress is suppressed, and membrane thicknesses down to 200 nm can be achieved.
Company Contact:
Contact Name: Jingzheng
Company Name: Jinan Jingzheng Electronics Co., Ltd.
Email:
Tel: +86-0531-66956298
Fax: +86-531-88809907
Street Address: D201, 750 Shunhua Road,
Jinan High-tech Zone, Jinan 250101, P. R. China
Website:
https://www.nanoln.com
Member name: Lnoi
Country:
China
Member Since: 04 January 2013
Total Leads:
277 Lnoi Import Export Business Leads
Business focus: Single Crystal Lithium Niobate Thin Film, Lithium Niobate Thin Film, Thin Lithium Tantalite, Linbo3 Film, Lnoi
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